Opto-mechanical automatic focusing system and method

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250561, 250306, 250311, 356375, G01J 120, G01N 2186

Patent

active

052162354

ABSTRACT:
The disclosed apparatus comprises a charged particle beam system and method including a particle beam generator for forming a beam of electrons, ions or other charged particles and for directing the beam along a predetermined axis to a focal point. Object support means support an object on the particle beam axis with the focal point on a surface of the object. There is provided an optical beam system forming part of an autofocusing system for maintaining the relative positions of the beam generating means and the object support means along the particle beam axis. The optical beam system comprises means for developing an optical beam, and means for directing the optical beam transversely to the particle beam axis and at an acute angle to the object surface. Means are provided for forming an optical beam first focus on a surface of the object. Optical image forming mirror means collects radiation from the optical beam first focus and forms a beam second focus in the vicinity of the beam first focus such that a change in the height or vertical position of the object surface along the particle beam axis produces a change in the position of the second focus indicative of the object surface height or position change.

REFERENCES:
patent: 3937959 (1976-02-01), Namae
patent: 4207467 (1980-06-01), Doyle
patent: 4230940 (1980-10-01), Minami et al.
patent: 4356392 (1982-10-01), Wittekoek et al.
patent: 4363962 (1982-12-01), Shida
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4698513 (1987-10-01), Tojo et al.
patent: 4990776 (1991-02-01), Fushimi et al.
patent: 5124562 (1992-06-01), Kawashima et al.
"An Automatic Focusing and Astigmatism Correction System for the SEM and CTEM", Journal of Microscopy, Vol. 127, Part 2, Aug. 1982 (pp. 185-189).
"Techniques for High Speed SEM Wafer Inspection for Production Applications" SPIE, vol. 1087, Integrated Circuit Metrology, Inspection and Process Control III (1989) (pp. 17-29).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Opto-mechanical automatic focusing system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Opto-mechanical automatic focusing system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Opto-mechanical automatic focusing system and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1816532

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.