Optimizing use and performance of optical systems...

Illumination – Plural light sources – With support

Reexamination Certificate

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C362S033000, C362S240000, C362S249060

Reexamination Certificate

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07862207

ABSTRACT:
Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

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Search Report and Written Opinion Concerning the Corresponding International Application No. PCT/US2006/026649.

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