X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2008-07-01
2008-07-01
Kao, Chih-Cheng Glen (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S043000, C378S082000
Reexamination Certificate
active
07394890
ABSTRACT:
An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.
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Duewer Frederick William
Wang Yuxin
Yun Wenbing
Houston Eliseeva LLP
Kao Chih-Cheng Glen
Xradia, Inc.
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