Optimized optical lithography illumination source for use...

Details Optimized optical lithography illumination source for use... Optimized optical lithography illumination source for use...

2006-05-16

2006-05-16

Tokar, Michael (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C359S650000

Reexamination Certificate

active

07046339

ABSTRACT:
A method and structure for optimizing an optical lithography illumination source comprises a shaped diffractive optical element (DOE) interposed between the illuminator and a lens during the exposure of a photoresist layer over a semiconductor wafer. The DOE may, in some instances, increase depth of focus, improve the normalized image log-slope, and improve pattern fidelity. The DOE is customized for the particular pattern to be exposed. Descriptions and depictions of specific DOE's are provided. Additionally, a pupilgram having a particular pattern, and methods for forming the pupilgram, are discussed.

REFERENCES:
patent: 6245468 (2001-06-01), Futrell et al.
patent: 6452662 (2002-09-01), Mulkens et al.
Frank Schellenberg, “A Little Light Magic”, IEEE Spectrum, Sep. 2003, pp. 34-39.
“LithoCruiser” Product Brochure, ASML MaskTools, undated, 2 pages.
“LithoCruiser”, Product Brochure, ASML MaskTools, 2002, 3 pages.

Affiliated with

Also associated with

Rating

Optimized optical lithography illumination source for use... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optimized optical lithography illumination source for use..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optimized optical lithography illumination source for use... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3638004