Optimized mirror design for optical direct write

Details Optimized mirror design for optical direct write Optimized mirror design for optical direct write

2007-06-27

2010-06-15

Davis, Daborah Chacko (Department: 1795)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C359S201200, C359S290000, C359S291000

Reexamination Certificate

active

07738078

ABSTRACT:
The present invention provides an optimized direct write lithography system using optical mirrors. That is, a maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used as a substitute for the traditional chrome on glass masks. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement. The direct-writing of a pattern portion may rely on a single mirror mode or a combination of modes.

REFERENCES:
patent: 5015080 (1991-05-01), Cassarly et al.
patent: 2005/0068510 (2005-03-01), Bleeker et al.
patent: 2006/0077506 (2006-04-01), Sandstrom
Shroff et al., “Optical Analysis of Mirror Based Pattern Generation”, Emerging Lithographic Technologies VII, pp. 550-559. © 2003.

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