Optics: measuring and testing – Dimension
Reexamination Certificate
2005-02-01
2005-02-01
Nguyen, Judy (Department: 2851)
Optics: measuring and testing
Dimension
C356S237400, C356S237500, C356S237200, C356S636000
Reexamination Certificate
active
06850333
ABSTRACT:
A metrology instrument for measuring grating-like microstructures on a sample for parameters of interest is characterized by an illumination spot that is elongated. The elongated illumination spot is produced by providing the designing the illumination optics to have a limiting aperture that is also elongated. The limiting aperture and corresponding illumination spot will have respective long directions that are perpendicular to each other. The sample is supported in a measurement relation to the instrument wherein the illumination spot is oriented generally transverse to linear elements of a microstructure. The microstructure can be also be a two-dimensional bigrating, with the illumination spot on a row or column of the bigrating.
REFERENCES:
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6011624 (2000-01-01), de Groot
patent: 6067162 (2000-05-01), Hagen et al.
patent: 6081325 (2000-06-01), Leslie et al.
patent: 6215551 (2001-04-01), Nikoonahad et al.
patent: 6256100 (2001-07-01), Banet et al.
patent: 6307635 (2001-10-01), Goldberg
patent: 6356399 (2002-03-01), Haga et al.
patent: 6426502 (2002-07-01), Finarov
patent: 6654131 (2003-11-01), Opsal et al.
J. Allgair et al., “Manufacturing Considerations for Implementation of Scatterometry for Process Monitoring,”In Metrology, Inspection, and Process Control for Microlithography XIV. Proceedings of SPIE,vol. 3998 (2000), pp. 135-134.
J.Bao et al., “Specular Spectral Profilometry on Metal Layers,”In Metrology, Inspection, and Process Control for Microlithography XIV, Proceedings of SPIE, vol. 3998 (2000), pp. 882-892.
Johnson Kenneth C.
Stanke Fred E.
Nguyen Judy
Sever Andrew
Stallman & Pollock LLP
Therma-Wave, Inc.
LandOfFree
Optimized aperture shape for optical CD/profile metrology does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optimized aperture shape for optical CD/profile metrology, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optimized aperture shape for optical CD/profile metrology will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3492128