Optically oriented photoresist pattern forming method using orga

Details Optically oriented photoresist pattern forming method using orga Optically oriented photoresist pattern forming method using orga

1989-02-24

1991-02-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Liquid crystal process, composition, or product

430325, 430326, 430296, 430330, 428 1, 350341, 350345, 350348, G03F 730

Patent

active

049961233

ABSTRACT:
An optically oriented photoresist material comprised of an organic polymer and an organic crystal material each having a different refractive index to form an optically oriented layer on a substrate wherein the optical waveguide is formed by an effect of the refractive index difference, and in said waveguide layer thus formed, the spread and scattering of lights are suppressed and very fine mask patterns of said photoresist can be produced.

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