Optics: measuring and testing – By alignment in lateral direction
Patent
1997-08-28
1999-09-14
Kim, Robert H.
Optics: measuring and testing
By alignment in lateral direction
250548, 148102D, 306400, G01B 1127
Patent
active
059531282
ABSTRACT:
Focus and exposure parameters may be controlled in a lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate. Corresponding dimensions of the resist shape and space are measured and the adequacy of focus or exposure dose are determined as a function of the measured dimensions. Etching parameters may also be controlled by creating a complementary tone pattern of etched shapes and spaces on a substrate. Corresponding dimensions of the etched shape and space are measured and the adequacy of etching parameters are determined as a function of the measured dimensions.
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Ausschnitt Christopher P.
Brunner Timothy A.
Thomas Alan C.
International Business Machines - Corporation
Kim Robert H.
Peterson Peter W.
Smith Zandra V.
Townsend Tiffany L.
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