Optical: systems and elements – Optical modulator – Light wave directional modulation
Reexamination Certificate
2006-07-18
2006-07-18
Wells, Nikita (Department: 2881)
Optical: systems and elements
Optical modulator
Light wave directional modulation
C359S254000, C359S259000, C359S316000, C359S290000, C359S291000, C250S492200
Reexamination Certificate
active
07079306
ABSTRACT:
An optically addressed extreme ultraviolet (EUV) modulator in which a spatial amplitude or phase pattern is provided to an EUV beam that is reflected from, or transmitted through the modulator. The modulator includes a modulator structure that includes a material with a high coefficient of thermal expansion. When a thermal impulse is incident on one part of the modulator, the resulting expansion changes the reflected phase or amplitude of the EUV beam from that part. A thermal pattern is imprinted on the modulator by absorption of a visible or ultraviolet pattern, resulting in a corresponding modulation of the EUV beam. A lithography system is based on the optically addressed EUV modulator.
REFERENCES:
patent: 5177628 (1993-01-01), Moddel
patent: 5178445 (1993-01-01), Moddel et al.
patent: 5486936 (1996-01-01), Fujikake et al.
patent: 5546181 (1996-08-01), Kobayashi et al.
patent: 5617203 (1997-04-01), Kobayashi et al.
patent: 5637883 (1997-06-01), Bowman et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5691836 (1997-11-01), Clark
patent: 5841489 (1998-11-01), Yoshida et al.
patent: 6025950 (2000-02-01), Tayebati et al.
patent: 6084656 (2000-07-01), Choi et al.
patent: 6140660 (2000-10-01), Mermelstein
patent: 6159643 (2000-12-01), Levinson et al.
patent: 6366389 (2002-04-01), Wraback et al.
patent: 6373619 (2002-04-01), Sandstrom
patent: 6399261 (2002-06-01), Sandstrom
patent: 6416855 (2002-07-01), Rossignol et al.
patent: 6479195 (2002-11-01), Kirchauer et al.
patent: 6489984 (2002-12-01), Johnson
patent: 6498685 (2002-12-01), Johnson
patent: 6548820 (2003-04-01), Mermelstein
patent: 6687041 (2004-02-01), Sandstrom
patent: 2003/0202233 (2003-10-01), Sandstrom
patent: 2005/0225836 (2005-10-01), Sandstrom
patent: WO 01/90439 (2001-11-01), None
Oldham et al., “Mirror-Based Pattern Generation For Maskless Lithography”, EECS Department, University of California, Berkeley, CA 94720, private communication, Dec. 2003.
Choksi et al., “Maskless Extreme Ultraviolet Lithography”, J. Vac. Sci. Technol. B 17(6), Nov./Dec. 1999, pps. 3047-3051.
Choksi et al., “Maskless Extreme Ultraviolet Lithography” J. Vac. Sci. Technol. B 17(6), Nov./Dec. 1999, pp. 3047-3051.
Search Report dated Apr. 11, 2005 from corresponding International Application No. PCT/US2004/027049.
Plex LLC
Smith II Johnnie L
Wells Nikita
Wolf Greenfield & Sacks P.C.
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