Optical waveguide transition and method of fabricating it

Details Optical waveguide transition and method of fabricating it Optical waveguide transition and method of fabricating it

1995-01-26

1997-08-19

Ngo, John

Optical waveguides

With optical coupler

Particular coupling structure

385131, 385132, 385 43, G02B 610

Patent

active

056596464

ABSTRACT:
The invention concerns an optical waveguide transition and its fabrication method, enabling coupling between a buried optical waveguide and a ridged optical waveguide. The transition structure is formed during etching of a layer containing the buried optical waveguide, the transition area being formed by adiabatically increasing the lateral dimensions of the buried waveguide. Top layers are deposited on the buried waveguide and its widened structure in the transition area, and the ridged optical waveguide is fabricated with one part on top of the transition area. Coupling of the respective propagation modes in the buried and ridged waveguides is effected by mode adaptation in the region between the two waveguide structures in the transition area. The transition of the invention is made in two conventional epitaxy steps.

REFERENCES:
patent: 3785717 (1974-01-01), Croset et al.
patent: 5142596 (1992-08-01), Mizuuchi et al.
Journal of Vacuum Science and Technology Part B, vol. 10, No. 6, Nov. 1992, New York, pp. 2979-2983 - Bruckner et al.
Electronics Letters, vol. 28, No. 17, 13 Aug. 1992, Stevenage GB, pp. 1610-1611, Yoshimoto et al.
Electronics Letters, vol. 29, No. 4, 18 Feb. 2993, Stevenage GB, pp. 326-328, Swander.

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