Optical waveguide manufacturing method

Etching a substrate: processes – Forming or treating optical article

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216 51, 216101, B44C 122

Patent

active

054178045

ABSTRACT:
An optical waveguide includes a substrate in the form of either a silicon substrate with a silicon oxide layer formed at its upper surface or a quartz substrate, a first waveguide layer extending over the entire upper surface of the substrate, a layer having a low refractive index and a tapered end disposed over part of an upper surface of the first waveguide layer, and a second waveguide layer of the same refractive index as that of the first waveguide layer extending over an exposed surface of the first waveguide layer and an upper surface of the layer of low refractive index.

REFERENCES:
patent: 4692207 (1987-09-01), Bouadma et al.
patent: 5032219 (1991-07-01), Buchmann et al.
patent: 5032220 (1991-07-01), Yamamoto et al.

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