Etching a substrate: processes – Forming or treating optical article
Patent
1993-10-25
1995-05-23
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 51, 216101, B44C 122
Patent
active
054178045
ABSTRACT:
An optical waveguide includes a substrate in the form of either a silicon substrate with a silicon oxide layer formed at its upper surface or a quartz substrate, a first waveguide layer extending over the entire upper surface of the substrate, a layer having a low refractive index and a tapered end disposed over part of an upper surface of the first waveguide layer, and a second waveguide layer of the same refractive index as that of the first waveguide layer extending over an exposed surface of the first waveguide layer and an upper surface of the layer of low refractive index.
REFERENCES:
patent: 4692207 (1987-09-01), Bouadma et al.
patent: 5032219 (1991-07-01), Buchmann et al.
patent: 5032220 (1991-07-01), Yamamoto et al.
Nishihara Munekazu
Ohnishi Youichi
Takebayashi Mikio
Matsushita Electric - Industrial Co., Ltd.
Powell William
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