Optical waveguide device and manufacturing method therefor

Optical waveguides – Directional optical modulation within an optical waveguide – Electro-optic

Reexamination Certificate

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C385S014000, C385S015000, C385S027000

Reexamination Certificate

active

07133580

ABSTRACT:
A manufacturing method for an optical waveguide device. The manufacturing method includes the steps of forming an optical waveguide in a substrate having an electro-optic effect, forming an SiO2film on the substrate, forming Si films on the SiO2film, the lower surface of the substrate, and at least a part of the side surface of the substrate to thereby make a conduction between the Si film formed on the SiO2film and the Si film formed on the lower surface of the substrate. The manufacturing method further includes the steps of applying a photoresist to the Si film formed on the SiO2film, patterning the photoresist so that a portion of the photoresist corresponding to the optical waveguide is left, forming a groove on the substrate along the optical waveguide by reactive ion etching, and removing the photoresist and the Si films.

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patent: 2001-284324 (2001-10-01), None

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