Optical waveguide and method for its manufacture

Details Optical waveguide and method for its manufacture Optical waveguide and method for its manufacture

1989-06-08

1990-06-19

Sikes, William L.

350 9631, G02B 610

Patent

active

049347748

ABSTRACT:
An optical waveguide is made by forming a layer of SiO.sub.2 on a substrate and implanting a region of the SiO.sub.2 layer with Si ions to define a region containing a stoichiometric excess of Si which defines a region having an elevated refractive index surrounded by a region having a lower refractive index. The resulting optical waveguide is stable at the high temperatures required for many semiconductor processing methods, and is useful for optical interconnection in integrated optical and optoelectronic devices.

REFERENCES:
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patent: 4715672 (1987-12-01), Duguay et al.
Zelmon et al., "A Low-Scattering Graded-Index SiO.sub.2 Planar Optical Waveguide Thermal Grown on Silicon"; Apply Physic Letters, vol. 42, No. 7, Apr. 1983; pp. 565-566.
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"Refractive Index Variations in Proton-Bombarded Fused Silica", Applied Physics Letters, vol. 24, No. 10, 15 May 1974--Presby et al.
"Compaction Of Ion-Implanted Fused Silica", Journal of Applied Physics, vol. 45, No. 1, Jan. 1974--E. EerNisse.
"Optical Properties Of Non-Crystalline Si, SiO, SiO.sub.x and SiO.sub.2 ", J. Phys. Chem. Solids, Pergamon Press 1987, vol. 32, pp. 1935-1945, Sep. 1970--H. R. Philipp.

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