Optical thin film for optical element

Optical: systems and elements – Light interference – Produced by coating or lamina

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359583, 359585, 359589, G02B 110

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active

058255494

ABSTRACT:
An optical thin film for an optical element is disclosed, which includes at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. A material for use in evaporation coating to prepare a thin film includes a mixture of at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3 and another dielectric. A further optical thin film includes a substrate and superimposed thereon are alternate layers. One such alternative layer having a high refractive index, and composed of a material containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. Another of such alternative layers having a low refractive index, and composed of SiO.sub.2. Another thin film includes a substrate and, superimposed thereon, at least one dielectric layer. The at least one dielectric layer being at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3, formed by vacuum evaporation coating.

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