Optical thin film coater

Details Optical thin film coater Optical thin film coater

1974-12-19

1976-02-24

Stein, Mervin

Coating apparatus

With vacuum or fluid pressure chamber

118 491, B05C 1102, C23C 1312

Patent

active

039397980

ABSTRACT:
Disclosed is an improved optical thin film coating system comprising all essential elements of resistive and electron beam evaporation systems, chemical vapor deposition systems and reactive plasma deposition systems. Sequences of cleaning and deposition processes which previously required moving substrates through several chambers are performed in a single vacuum chamber. The evaporative sources also efficiently vaporize solid materials to provide reactive gases for reactive plasma and chemical vapor deposition processes, which were previously difficult or impossible to perform. Substrate movement, masking, and monitoring means previously used with evaporative sources are used to control thickness and uniformity of films deposited by chemical vapor and reactive plasma processes, to provide optical quality films.

REFERENCES:
patent: 2391595 (1945-12-01), Richards et al.
patent: 2456708 (1948-12-01), Kellogg
patent: 3608519 (1971-09-01), Bean et al.
patent: 3636916 (1972-01-01), Thelen et al.
patent: 3664295 (1972-05-01), Ng et al.

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