Optical system with isolated measuring structure

Details Optical system with isolated measuring structure Optical system with isolated measuring structure

2005-03-08

2005-03-08

Turner, Samuel A. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

06864988

ABSTRACT:
An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.

REFERENCES:
patent: 5633681 (1997-05-01), Baxter et al.
patent: 6036162 (2000-03-01), Hayashi
patent: 6549270 (2003-04-01), Ota
patent: 41 34 016 (1993-04-01), None
patent: 0 397 179 (1990-11-01), None
“Foundations of Ultraprecision Mechanism Design”, S.T. Smith and D.G. Chetwynd, pp. 66-71.

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