Optical system of an illumination device of a projection...

Details Optical system of an illumination device of a projection... Optical system of an illumination device of a projection...

2007-03-13

2011-11-29

Chapel, Derek S (Department: 2872)

Optical: systems and elements

Polarization without modulation

Polarization by birefringence

C359S015000

Reexamination Certificate

active

08068279

ABSTRACT:
The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

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Merriam-Webster's Collegiate Dictionary, Eleventh Edition, Merriam-Webster Incorporated, 2004, p. 650.
Office action from the counterpart pending EP Application No. 07 103 867.3, dated Mar. 3, 2008.

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