Optical system for maskless lithography

Details Optical system for maskless lithography Optical system for maskless lithography

2006-09-19

2006-09-19

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S047000, C355S067000, C430S005000

Reexamination Certificate

active

07110082

ABSTRACT:
A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.

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Search Report from Singapore Patent Application No. 2004031819-6, dated Jan. 20, 2005, 7 pages.

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