Optical system for focus correction for a lithographic tool

Details Optical system for focus correction for a lithographic tool Optical system for focus correction for a lithographic tool

1985-04-26

1987-02-24

Laroche, Eugene R.

Optics: measuring and testing

Angle measuring or angular axial alignment

Sides of angle or axes being aligned transverse to optical...

356152, G01B 1127

Patent

active

046453385

ABSTRACT:
An apparatus and process for determining focus correction for a lithographic tool are provided. A periodic surface relief structure containing focus information is illuminated so that diffraction beams are generated. An object is translated orthogonally to the periodic structure to cause a change in the intensity of the diffracted beams. Focus correction is determined based upon the changes in the intensity of the diffracted beams.

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patent: 4585337 (1986-04-01), Phillips

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