Optical system for aligning two patterns and a photorepeater emb

Details Optical system for aligning two patterns and a photorepeater emb Optical system for aligning two patterns and a photorepeater emb

1980-12-03

1983-01-04

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With light detector

355 53, G01B 1126

Patent

active

043670466

ABSTRACT:
An optical system for aligning two patterns in which the alignment takes place in two phases. In the first phase, the first pattern is aligned with respect to a third fixed intermediate pattern, forming a reference, and during the second phase the second pattern is aligned with respect to this third pattern. The first pattern is formed by a pair of alignment reference marks and the third pattern comprises a first pair of complementary reference marks. The second pattern is also formed by a pair of alignment reference marks and the third pattern comprises a second pair of complementary reference marks. In a preferred embodiment, these latter reference marks are formed by optical networks. The projection of one network on the complementary network produces orders of diffraction which are detected by opto-electronic means.

REFERENCES:
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4171162 (1979-10-01), Gerard et al.
patent: 4251160 (1981-02-01), Bouwhuis et al.

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