Optical system, exposure apparatus using the same and device...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

11067072

ABSTRACT:
An exposure apparatus includes an optical system for guiding light with a central wavelength between 5 and 20 nm from a light source to an object to be exposed, the optical system including a first mirror and a second mirror, a first controller for controlling a temperature of the first mirror to a first zero cross temperature, at which the first mirror has a coefficient of thermal expansion of zero, and a second controller for controlling a temperature of the second mirror to a second zero cross temperature, at which the second mirror has a coefficient of thermal expansion of zero, the second zero cross temperature being different from the first zero cross temperature.

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European Patent Office Search Report dated Aug. 4, 2006.

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