Optical synthetic quartz glass and method for producing the...

Details Optical synthetic quartz glass and method for producing the... Optical synthetic quartz glass and method for producing the...

2007-12-25

2007-12-25

Green, Anthony J. (Department: 1793)

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

C501S053000, C065S017100, C065S017200, C065S030100, C065S384000, C065S397000, C065S424000

Reexamination Certificate

active

10548237

ABSTRACT:
The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017to 10×1017molecules/cm3and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

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