Radiant energy – Photocells; circuits and apparatus – Interference pattern analysis
Patent
1999-03-23
2000-10-31
Epps, Georgia
Radiant energy
Photocells; circuits and apparatus
Interference pattern analysis
355 53, 356351, 359 9, 359 11, 359 15, G02B 2742, G02B 532, G03B 2742, G01B 1102, G03H 110
Patent
active
061406600
ABSTRACT:
A synthetic aperture system for producing a non-periodic pattern in a region of overlap. The system includes a source of electromagnetic radiation producing a plurality of electromagnetic beams, a plurality of beam controllers positioned to receive a respective one of the plurality of electromagnetic beams and direct the respective electromagnetic beam into the region of overlap; and a system controller in electrical communication with each of the plurality of the beam controllers. Each beam controller controls at least one of the phase, amplitude and polarization of a respective one of the plurality of electromagnetic beams in response to control signals from the system controller. The result is a non-periodic pattern formed within the region of overlap by the interference of a plurality of electromagnetic beams in response to the control signals from the system controller.
The invention also relates to a method for producing a non-periodic pattern in a region of overlap. The method includes the steps of providing a plurality of electromagnetic beams, directing the plurality of electromagnetic beams into the region of overlap, and modulating at least one of the phase, amplitude and polarization of at least one of the plurality of electromagnetic beams to thereby form a predetermined non-periodic pattern in the region of overlap by the interference of the plurality of electromagnetic beams.
REFERENCES:
patent: Re35930 (1998-10-01), Brueck et al.
patent: 5142386 (1992-08-01), Anderson et al.
patent: 5384573 (1995-01-01), Turpin
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5705321 (1998-01-01), Brueck et al.
patent: 5759744 (1998-06-01), Brueck et al.
patent: 5771098 (1998-06-01), Ghosh et al.
Anderson, et al. "Holographic lithography with thick photoresist," Appl. Phys. Lett., vol. 43, No. 9, Nov. 1, 1983, pp. 874-876.
Brueck, S. "Imaging interferometric lithography," Microlithography World, Winter 1998, pp. 2-7.
Brueck, et al. "Interferometric lithography--from periodic arrays to arbitrary patterns," Microeletronic Engineering, 41/42 (1998), pp. 145-148.
Chen et al. "Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications," Journal of Vacuum Science & Technology B, Second Series, vol. 14, No. 5, Sep./Oct. 1996, pp. 338-3349.
Chen et al. "Process development for 180-nm structures using interferometric lithography and I-line photoresist," SPIE-The International Society for Optical Engineering, vol. 3048, Mar. 10-11, 1997, pp. 309-318.
Farhoud et al. "Fabrication of Large Area Nanostructured Magnets by Interferometric Lithography," IEEE Transactions of Magnetics, vol. 34., No. 4, Pt. 1, Jul. 1998, pp. 1087-1089.
Ferrera et al. "Analysis of distortion in interferometric lithography," Journal of Vacuum Science & Technology B, Second Series, vol. 14, No. 6, Nov./Dec. 1996, pp. 4009-4013.
Naqvi et al. "Diffractive techniques for lithographic process monitoring and control," Journal of Vacuum Science & Technology B, Second Series, vol. 12, No. 6, Nov./Dec. 1994, pp. 3600-3607.
Savas et al. "Large-area achromatic interferometric lithography for 100 nm period gratings and grids," Journal of Vacuum Science & Technology B, Second Series, vol. 14, No. 6, Nov./Dec. 1996, pp. 4167-4170.
Savas et al. Achromatic interferometric lithography for 100-nm-period gratings and grids, Journal of Vacuum Science & Technology B, Second Series, vol. 13, No. 6. Nov./Dec. 1995, pp. 2732-2735.
Schattenburg et al. "Fabrication of high energy x-ray transmission gratings for AXAF," SPIE-The International Society for Optical Engineering, vol. 2280, pp. 181-190.
Schattenburg et al. "Optically matched trilevel resist process for nanostructure fabrication," Journal of Vacuum Science & Technology B, Second Series, vol. 13, No. 6, Nov./Dec. 1995, pp. 3007-3011.
Spallas et al. "Field emitter array mask patterning using laser interference lithography," Journal of Vacuum Science & Technology B, Second Series, vol. 13, No. 6, Sep./Oct. 1995, pp. 1973-1978.
Zaidi et al. "Interferometric lithography exposure tool for 180-nm structures," SPIE-The International Society for Optical Engineering, vol. 3048, Mar. 10-11, 1997, pp. 248-254.
Zaidi et al. "Multiple-exposure interferometric lithography," Journal of Vacuum Science & Technology B, Second Series, vol. 11, No. 3, May/Jun. 1993, pp. 658-666.
Epps Georgia
Massachusetts Institute of Technology
Spector David N.
LandOfFree
Optical synthetic aperture array does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optical synthetic aperture array, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical synthetic aperture array will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2054788