Optical Shield for liquid crystal devices and method of fabricat

Details Optical Shield for liquid crystal devices and method of fabricat Optical Shield for liquid crystal devices and method of fabricat

1987-12-17

1989-06-06

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 7, 430294, 350339F, G02F 113, G03C 900

Patent

active

048370975

ABSTRACT:
An optical shield for a liquid crystal dot shutter image bar and fabrication process therefor. In one embodiment, a layer of dye-in-photoresist is formed on the interior surface of one of the glass substrates and over the one or more electrodes thereon. The photoresist layer is exposed through a mask and developed to form an optical shield having the desired configuration of optical apertures and a thickness of 2 to 3 micrometers. Alternate embodiments use two separate dye loaded layers that do not react with each other or dissolve in similar solvents. The first layer is dye loaded PMMA layer covered by a dye-in-photoresist. The dye can be selected to filter any desired spectral region.

REFERENCES:
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patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4383017 (1983-05-01), Hirofumi et al.
patent: 4487481 (1984-12-01), Suzawa
patent: 4567132 (1986-01-01), Federicks et al.
patent: 4568631 (1986-02-01), Badami et al.
patent: 4589732 (1986-05-01), Shiraishi et al.
patent: 4595259 (1986-06-01), Perregaux

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