Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction
Patent
1998-02-27
2000-05-02
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With heterojunction
257 96, 257 97, 257 98, 257103, 438 22, 438 34, 372 45, 372 46, H01L 3300
Patent
active
060575611
ABSTRACT:
A ZnO thin film is fabricated on the c-surface of a sapphire substrate through use of a laser molecular beam epitaxy (MBE) method-which is effective for epitaxial growth of an oxide thin film through control at an atomic level. The thus-formed ZnO thin film has a considerably high crystallinity; the half width of an X-ray rocking curve was 0.06.degree.. The thin film is of an n-type and has a carrier density of 4.times.10.sup.17 /cm.sup.3. The thin film fabricated in a state in which oxygen partial pressure is held constant at 10.sup.-6 Torr has a structure in which hexagon-shaped nanocrystals of uniform size are close-packed, reflecting the crystal behavior of a wurtzite type. Since in each nanocrystal there is observed a spiral structure formed by steps of a unit cell height (0.5 nm), the nanocrystals are considered to grow in a thermodynamically equilibrated state. The lateral size of the nanocrystal can be controlled within the range of approximately 50 to 250 nm. A II-oxide optical semiconductor element utilizes a zinc oxide thin film containing magnesium or cadmium in a solid-solution state. Through addition of magnesium or cadmium, the band gap of zinc oxide can be controlled within the range of 3 to 4 eV.
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Kawasaki Masashi
Koinuma Hideomi
Ohtomo Akira
Segawa Yusaburo
Yasuda Takashi
Japan Science and Technology Corporation
Mintel William
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