Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission
Reexamination Certificate
2006-01-10
2006-01-10
Coleman, W. David (Department: 2823)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Low workfunction layer for electron emission
C257S077000, C257S079000
Reexamination Certificate
active
06984840
ABSTRACT:
An optical semiconductor device includes an SiC substrate having an n-type conductivity, and an AlGaN buffer layer having an n-type conductivity formed on the SiC substrate with a composition represented as AlxGa1-xN, wherein the AlGaN buffer layer has a carrier density in the range between 3×1018–1×1020cm−3, and the compositional parameter x is larger than 0 but smaller than 0.4 (0<x<0.4).
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Horino Kazuhiko
Kubota Shin'ichi
Kuramata Akito
Soejima Reiko
Fujitsu Limited
Westerman Hattori Daniels & Adrian LLP
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