Optical semiconductor device having a diffraction grating and fa

Details Optical semiconductor device having a diffraction grating and fa Optical semiconductor device having a diffraction grating and fa

1999-06-15

2000-07-11

Davie, James W.

Coherent light generators

Particular active media

Semiconductor

372 45, 372 46, 372 96, H01S 3085

Patent

active

060883774

ABSTRACT:
A method of fabricating an optical semiconductor device includes the steps of irradiating a substrate by a first optical beam and a second optical beam such that the first and second optical beams form interference fringes on the substrate, exposing a resist film provided on the substrate by the interference fringes to form a resist pattern, and forming a diffraction grating pattern on the substrate in accordance with the interference fringes by using the resist pattern as a mask. The first and second optical beams are irradiated such that a wavefront of the first optical beam and a wavefront of the second optical beam intersect at an intersection line parallel to the substrate, and the irradiating step is conducted by refracting the first and second optical beams by an optical element having a smooth surface inclined with respect to a plane parallel to the substrate in the direction of the foregoing intersection line and further inclined in a perpendicular direction.

REFERENCES:
patent: 5960023 (1999-09-01), Takahashi

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