Optical scattering free metal oxide films and methods of making

Details Optical scattering free metal oxide films and methods of making Optical scattering free metal oxide films and methods of making

1987-02-13

1988-10-04

Corbin, John K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

350164, 350320, 427164, 428623, G02B 110, G02B 528

Patent

active

047752033

ABSTRACT:
Optically non-scattering films of titanium dioxide for use in optical elements are prepared by overcoating a non-scattering layer of titanium dioxide with an amorphous layer of silicon dioxide at a temperature which is below the crystallization temperature of the non-scattering film of titanium dioxide. Titanium dioxide and silicon dioxide layers can be deposited by a fusion chemical vapor deposition technique by pyrolytic decomposition of suitable precursors containing the necessary constituents of the respective film layers.

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patent: 4508054 (1985-04-01), Baumberger et al.
patent: 4565747 (1986-01-01), Nakae et al.
patent: 4582764 (1986-04-01), Allerd et al.

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