Optical retardation plate and method of manufacturing the same

Optical: systems and elements – Diffraction – From grating

Reexamination Certificate

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C359S596000

Reexamination Certificate

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07428101

ABSTRACT:
A dielectric substrate having a refractive index n1is covered with an amorphous dielectric medium having a refractive index n2larger than the refractive index n1, and a rectangular grating is formed in the amorphous dielectric medium through an etching process. When microcrystal is formed in the amorphous dielectric medium through a thermal treatment to increase the refractive index n2, a magnitude Δn of structure double refraction increases accordingly. Hence, a phase refraction ΔΦ of an irregular grating pattern in the rectangular grating becomes large without increasing a depth D of each trench of the rectangular grating, and thus it is possible to obtain an optical retardation plate having a fine periodic structure and having a desired plate retardation.

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D.C. Flanders, Applied Physics Letters, vol. 42, No. 6 (Mar. 15, 1983), pp. 492 to 494.
Wenyong, Deng et al; “Fabrication and Properties of Visible-Light Sub-Wavelength Amorphous Silicon Transmission Gratings”; Journal of Vacuum Science and Technology; Part B. vol. 13, No. 6, Nov./Dec. 1995 (Nov. 1, 1995), New York, NY, pp. 2879-2882.
Kim, D. J. et al; “Influence of calcination temperature on structural and optical properties of Ti02 thin fims prepared by sol-gel dip coating”; Materials Letters, vol. 57, No. 2, Dec. 2002, pp. 355-360.
Flanders, D.C.; “Submicrometer Periodicity Gratings as Artificial Anisotropic Dielectrics”, Applied Physics Letters, vol. 42, No. 6, 1983, pp. 492-494.
European Search Report dated Apr. 28, 2005.

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