Optical proximity correction photomasks

Details Optical proximity correction photomasks Optical proximity correction photomasks

2005-10-07

2009-08-25

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07579121

ABSTRACT:
An optical proximity correction photomask comprises a transparent substrate, a main feature having a first transmitivity disposed on the transparent substrate and at least one assist feature having a second transmitivity disposed to each side of the main feature and on the transparent substrate, wherein the first transmitivity is not equal to the second transmitivity.

REFERENCES:
patent: 5786113 (1998-07-01), Hashimoto et al.
patent: 5821014 (1998-10-01), Chen et al.

Affiliated with

Also associated with

Rating

Optical proximity correction photomasks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical proximity correction photomasks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical proximity correction photomasks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4096722