Optical proximity correction method and system

Details Optical proximity correction method and system Optical proximity correction method and system

1996-05-16

1999-01-19

Teska, Kevin J.

Boots, shoes, and leggings

364878, 378 34, 378 35, 2504922, 382144, 382145, 382151, G06F 1750, G06K 903

Patent

active

058620583

ABSTRACT:
An optical proximity correction method and system are disclosed that allows for the correction of line width deviations caused by nonlinear lithography tools by calculating required chrome on glass line widths for a desired printed line. Line width correction is determined based only on the pitch of the line, defined as the width of the line and the distance to an adjacent line. Correction information is calculated from an aerial simulation and is then organized by pitch to provide a more efficient means of line correction.

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