Optical proximity correction method

Details Optical proximity correction method Optical proximity correction method

1996-12-20

1999-03-09

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430942, G03F 900, G03C 500

Patent

active

058798447

ABSTRACT:
Pattern data that is an object of correction is divided into an area on which correction is made using correction values that have been obtained in advance for patterns and their respective layouts and an area on which correction is made on the basis of correction values calculated by a simulator. For example, simulation-based correction is made on a gate layer in a memory, while rule-based correction is made on a gate layer in the other area than the memory on the basis of rules for active gate width only. After being subjected to the correction, the areas are combined.

REFERENCES:
Spie, vol. 2322, pp. 229-238, 1994, Lars W. Liebmann, et al., "Optical Proximity Correction, A First Look At Manufacturability".
Jpn. J. Appl. Phys., vol. 34, pp. 6547-6551, 1995, Eiichi Kawamura, et al., "Simple Method of Correcting Optical Proximity Effect For 0.35 .mu.m Logic LSI Circuits".
SPIE, vol. 2197, pp. 278-293, 1994, Oberdan W. Otto, et al., "Automated Optical Proximity Correction-A Rules-Based Approach".
Spie, vol. 2197, pp. 361-370, 1994, Richard C. Henderson, et al., "Correcting for Proximity Effect Widens Process Latitude".
SPIE, vol. 2240, pp. 261-269, 1995, Satomi Shioiri, et al., "Fast Optical Proximity Correction: Analytical Method".

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