Optical projection systems and projection-exposure apparatus com

Details Optical projection systems and projection-exposure apparatus com Optical projection systems and projection-exposure apparatus com

1997-04-24

1999-09-28

Sugarman, Scott J.

Optical: systems and elements

Lens

Telecentric system

359726, 359730, G02B 1322, G02B 1700

Patent

active

059597844

ABSTRACT:
The invention pertains to optical projection-exposure apparatus for photolithography that can focus a pattern defined by a mask onto a non-flat substrate. In one embodiment, piezoelectric elements are used as an actuator for adjusting the optical path length between the mask and the substrate. A first reflector reflects a light flux transmitted by the mask. A telecentric optical system then forms an image of the mask in a focal plane. A second reflector reflects the light flux from the telecentric perpendicularly onto the substrate. The actuator moves the first or second reflectors, changing the optical path length of the light flux. A focus sensor detects the height of the sensitized surface of the substrate in a direction perpendicular to the sensitized surface of the substrate and thereby provides a focus signal to the actuator. The actuator then moves the focal plane to the sensitized surface.

REFERENCES:
patent: 5581075 (1996-12-01), Naraki et al.
patent: 5585972 (1996-12-01), Markle
patent: 5729331 (1998-03-01), Tanaka et al.

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