Optical projection system including a refractive lens assembly h

Details Optical projection system including a refractive lens assembly h Optical projection system including a refractive lens assembly h

1991-07-11

1992-11-03

Hannaher, Constantine

Optical: systems and elements

Lens

Multiple component lenses

359795, G02B 1700

Patent

active

051610620

ABSTRACT:
A photolithographic projection optical system comprising: a source of exposure energy for generating a beam of energy; an optical element located in the path of the beam for receiving the beam of energy and passing the beam therethrough; a refractive lens assembly located in the path of the portion of the beam for receiving and transmitting the beam of energy, the refractive lens assembly comprising at least one meniscus lens, a plano-convex lens, and an air gap disposed between the meniscus lens and the plano-convex lens; a reticle element located in the path of the portion of the beam, the reticle element having a uniform thickness and being positioned for permitting the beam to pass through the thickness and through the lens assembly to the optical element. Alternatively, the air gap of the refractive lens assembly can be replaced with a glass layer having an index of refraction that is lower than both the meniscus lens and the plano-convex lens.

REFERENCES:
patent: 4964704 (1990-10-01), Shinohara
patent: 5040882 (1991-08-01), Markle

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