Optical projection exposure method and system using the same

Details Optical projection exposure method and system using the same Optical projection exposure method and system using the same

1992-04-03

1993-05-04

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

052086291

ABSTRACT:
According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.

REFERENCES:
patent: 5062692 (1991-11-01), Marui et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5121160 (1992-06-01), Sano et al.
patent: 5144362 (1992-09-01), Kamon et al.
H. Fukuda et al., "New Approach to Resolution Limit and Advanced Image Formation Techniques in Optical Lithography", IEEE Transactions on Electron Devices. vol. 38, No. 1, Jan. 1991, pp. 67-75.
D. L. Fehrs et al., "Illuminator Modification of an Optical Aligner", KTI Microelectronics Seminar, Nov. 6-7, 1989, San Diego, pp. 217-230.

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