Optical processing furnace with quartz muffle and diffuser plate

Details Optical processing furnace with quartz muffle and diffuser plate Optical processing furnace with quartz muffle and diffuser plate

1994-02-07

1995-09-19

Jeffery, John A.

Electric resistance heating devices

Heating devices

Radiant heater

219390, 219411, 392408, 250504R, 118724, 427557, 359599, 437247, 216 24, 216 60, 216 66, H05B 102, H01L 21205

Patent

active

054523966

ABSTRACT:
An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.

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Van Winkle, H. E., "One Way Radiant Heat Transfer", vol. 18, No. 4, Sep. 1975, IBM Tech. Disclosure.

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