Optical position measuring system using an interference pattern

Details Optical position measuring system using an interference pattern Optical position measuring system using an interference pattern

2006-03-07

2006-03-07

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07009713

ABSTRACT:
A position measuring system including a laser light source for radiating a laser beam, an optical lens system for generating an interference pattern on the basis of the laser beam having passed through different optical paths, a detector for detecting the interference pattern, and an arithmetic unit for calculating the position of at least one of the light source and the detector on the basis of a detection signal issued from the detector. For example, a spherical lens can be used as the optical lens system. In this case, the interference pattern is formed on the basis of spherical aberration of the lens. Alternatively, a multifocal lens may be used as the optical lens system.

REFERENCES:
patent: 4627722 (1986-12-01), Falk et al.
patent: 5699158 (1997-12-01), Negishi
patent: 6100538 (2000-08-01), Ogawa
patent: 6714311 (2004-03-01), Hashimoto
patent: B2 4-8724 (1992-02-01), None

Affiliated with

Also associated with

Rating

Optical position measuring system using an interference pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical position measuring system using an interference pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical position measuring system using an interference pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3534940