Optical position calibration system

Details Optical position calibration system Optical position calibration system

1995-06-07

1998-04-21

Font, Frank G.

Optics: measuring and testing

By polarized light examination

With light attenuation

G01B 1114

Patent

active

057423938

ABSTRACT:
An apparatus and method for precisely calibrating the transfer arm of a multiple station wafer processing system without breaking vacuum and with a minimum of system downtime is provided. A system of determining and properly aligning the crystallographic orientation of the wafers before processing as well as monitoring the orientation of individual wafers during wafer transfer between processing stations is also provided.

REFERENCES:
patent: 4667109 (1987-05-01), Kano
patent: 4819167 (1989-04-01), Cheng et al.
patent: 4833790 (1989-05-01), Spencer et al.
patent: 5102280 (1992-04-01), Poduje et al.
patent: 5256871 (1993-10-01), Baldwin
patent: 5483138 (1996-01-01), Smookler et al.
patent: 5511005 (1996-04-01), Abbe et al.

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