Optical micrometer for measuring thickness of transparent substr

Details Optical micrometer for measuring thickness of transparent substr Optical micrometer for measuring thickness of transparent substr

1997-10-29

1999-09-28

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356360, G01B 902

Patent

active

059597313

ABSTRACT:
Techniques and systems for measuring absolute thickness, the total thickness variation, and electric resistivity of a semiconductor substrate in a nondestructive optical fashion. Optical absorption is used to measure the absolute thickness of a semiconductor substrate with a light source and a photo transceiver. The thickness is determined by comparing the amount of absorption to a calibrated amount. Both the absolute thickness and total thickness variation of the substrate can be measured based on light absorption using an imaging device. The invention can be used to directly image and measure localized features formed on micro machined substrates. The resistivity of a substrate sample can also be measured by using an alternating electrical signal.

REFERENCES:
patent: 4773760 (1988-09-01), Makkonen
patent: 4984894 (1991-01-01), Kondo
patent: 5403433 (1995-04-01), Morrison et al.

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