Optical metrology using a photonic nanojet

Details Optical metrology using a photonic nanojet Optical metrology using a photonic nanojet

2007-03-20

2008-07-01

Lauchman, L. G. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237200, C356S237300, C356S445000, C356S342000

Reexamination Certificate

active

07394535

ABSTRACT:
An inspection area on a semiconductor wafer can be examined using a photonic nanojet. The photonic nanojet, an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere, is generated. The inspection area is scanned with the photonic nanojet. A measurement is obtained of the retroreflected light from the dielectric microsphere as the photonic nanojet scans the inspection area. The existence of a structure in the inspection area is determined with the obtained measurement of the retroreflected light.

REFERENCES:
Chen et al. , U.S. Appl. No. 11/726,076, “Automated Process Control Using Optical Metrology With A Photonic Nanojet”, filed Mar. 20, 2007.
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Chen, Z. et al. (Apr. 5, 2004). “Photonic Nanojet Enhancement of Backscattering of Light by Nanoparticles: a Potential Novel Visible-Light Ultramicroscopy Technique,”Optics Express12(7):1214-1220.
Chen, Z. et al. (Jan. 15, 2006). “Superenhanced Backscattering of Light by Nanoparticles,”Optics Letters31(2):196-198.
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U.S. Appl. No. 11/726,076, filed Mar. 20, 2007.

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