Optical metrology optimization for repetitive structures

Details Optical metrology optimization for repetitive structures Optical metrology optimization for repetitive structures

2008-06-17

2009-11-10

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

C356S604000, C702S167000

Reexamination Certificate

active

07616325

ABSTRACT:
An optical metrology model for a structure to be formed on a wafer is developed by characterizing a top-view profile and a cross-sectional view profile of the structure using profile parameters. The profile parameters of the top-view profile and the cross-sectional view profile are integrated together into the optical metrology model. The profile parameters of the optical metrology model are saved.

REFERENCES:
patent: 5442676 (1995-08-01), Fewster et al.
patent: 5530732 (1996-06-01), Takemi
patent: 5748509 (1998-05-01), Fewster et al.
patent: 5773174 (1998-06-01), Koizumi et al.
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 6256100 (2001-07-01), Banet et al.
patent: 6429930 (2002-08-01), Littau et al.
patent: 6522413 (2003-02-01), Opsal et al.
patent: 6639674 (2003-10-01), Sokolov et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6823043 (2004-11-01), Fewster et al.
patent: 6891626 (2005-05-01), Niu et al.
patent: 6917433 (2005-07-01), Levy et al.
patent: 6943900 (2005-09-01), Niu et al.
patent: 7046375 (2006-05-01), Bischoff et al.
patent: 7065423 (2006-06-01), Prager et al.
patent: 7092110 (2006-08-01), Balasubramanian et al.
patent: 7126700 (2006-10-01), Bao et al.
patent: 7216045 (2007-05-01), Doddi et al.
patent: 7330279 (2008-02-01), Vuong et al.
patent: 7355728 (2008-04-01), Li et al.
patent: 7382447 (2008-06-01), Mieher et al.
patent: 7388677 (2008-06-01), Vuong et al.
patent: 7427521 (2008-09-01), Bischoff et al.
patent: 2003/0028358 (2003-02-01), Niu et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
patent: 2006/0187466 (2006-08-01), Li et al.
Chemali, C. E. et al. (Aug. 2004). “Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the Prolith Simulator,”IEEE Transactions on Semiconductor Manufacturing17(3):388-401.
Haykin, S. (1999).Neural Networks. 2nd edition, M. Horton ed., Prentice Hall: Upper Saddle River, New Jersey, 9 pages (Table of Contents).
International Search Report and Written Opinion mailed Jan. 24, 2007, for PCT Application No. PCT/US2006/04151 filed Feb. 6, 2006, 12 pages.
International Search Report and Written Opinion mailed Sep. 25, 2007, for PCT Application No. PCT/US06/34610 filed Sep. 5, 2006, 8 pages.
Li, L. (1996). “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,”Journal of the Optical Society of America A13:1024-1035.

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