Optical metrology of single features

Optics: measuring and testing – Dimension – Width or diameter

Reexamination Certificate

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Reexamination Certificate

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07030999

ABSTRACT:
The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.

REFERENCES:
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patent: 6429943 (2002-08-01), Opsal et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
Bischoff, Jörg et al, “Single feature metrology by means of light scatter analysis”, SPIE vol. 3050 (Jul. 1997), pp. 574-585.
Jenkins and White, Fundamentals of Optics, 3rd Edition, McGraw-Hill, New York, 1957, pp 306-308.
International Search Report mailed Mar. 2, 2004, for PCT patent application No. PCT/US03/18186 filed Jun. 9, 2003, 3 pages.

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