Optical metrology of single features

Optics: measuring and testing – Shape or surface configuration – Triangulation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S237200, C356S607000

Reexamination Certificate

active

07379192

ABSTRACT:
The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.

REFERENCES:
patent: 5880838 (1999-03-01), Marx et al.
patent: 6049220 (2000-04-01), Borden et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6137570 (2000-10-01), Chuang et al.
patent: 6429943 (2002-08-01), Opsal et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 7106425 (2006-09-01), Bultman et al.
Bischoff, Jorg et al, (Jul. 1997) “Single feature metrology by means of light scatter analysis”, SPIE vol. 3050 , pp. 574-585.
Jenkins et al.,Fundamentals of Optics, 3rd Edition, McGraw-Hill, New York, 1957, pp. 306-308.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical metrology of single features does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical metrology of single features, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical metrology of single features will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2789525

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.