Optical metrology model optimization based on goals

Details Optical metrology model optimization based on goals Optical metrology model optimization based on goals

2007-01-30

2007-01-30

Pert, Evan (Department: 2826)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C438S016000, C702S085000, C703S006000

Reexamination Certificate

active

10946729

ABSTRACT:
The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.

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