Optical method for controlling thin film growth

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

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C356S630000, C356S504000

Reexamination Certificate

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07835018

ABSTRACT:
A method of determining the rate of change of optical thickness of a thin-film during deposition comprising the steps of illuminating the thin-film with electromagnetic radiation having a range of wavelengths, measuring the transmission spectrum of the thin-film at least twice during the deposition process to determine the wavelength λtor turning points in the transmission spectrum, and using the measurements to determine the rate to change of optical thickness of the thin-film as a function of time. The method further comprises the steps of predicting a time T in the growth process at which the wavelength λtof the turning point in the transmission spectrum of the thin-film will be substantially equal to the wavelength λdof the turning point in the transmission spectrum of thin-film at its optical design thickness, and interrupting the growth process such that growth ceases at time T.

REFERENCES:
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patent: 2001021324 (2001-01-01), None
“Thin Film Thickness Monitor” Solid State Technology, vol. 33, pp. 48-50 (1990).

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