Optical members and blanks of synthetic silica glass and method

Details Optical members and blanks of synthetic silica glass and method Optical members and blanks of synthetic silica glass and method

1991-12-06

1994-06-28

Lerner, Martin

Optical: systems and elements

Having significant infrared or ultraviolet property

65 311, 65 312, 65900, 252588, G02B 100, C03C 2502

Patent

active

053252306

ABSTRACT:
The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

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