Optical member for photolithography, method for evaluating optic

Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component

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359664, 356124, G02B 1314, G02B 300

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active

060259558

ABSTRACT:
In a method for evaluating the homogeneity of the refractive index of an optical member, the refractive index distribution of the optical member is measured, the measured refractive index distribution is separated into a rotationally symmetric element and a non-rotationally symmetric element in the optical axis direction before or after correction of the power element, and the rotationally symmetric element is further subjected to 2nd/4th-order element correction. Upon execution of such comprehensive evaluation, a photolithography optical member, which can realize a fine, sharp exposure-transfer pattern (e.g., a line width of 0.3 .mu.m or less) is provided.

REFERENCES:
patent: 4696569 (1987-09-01), Geary et al.
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5157555 (1992-10-01), Reno
patent: 5234742 (1993-08-01), Hatano et al.
Freitag et al., "Aberration analysis in aerial images formed by lithographic lenses", Applied Optics, May 1, 1992, vol. 31, No. 13, pp. 2284-2290.
U.S. patent application 08/193,474 filed on Feb. 8, 1994 by Hiraiwa et al.

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