Optical measurements of patterned structures

Details Optical measurements of patterned structures Optical measurements of patterned structures

2007-11-06

2007-11-06

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrophotometer

C356S326000, C356S310000, C356S237200

Reexamination Certificate

active

10513035

ABSTRACT:
A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for generating incident radiation, a spectrophotometer arrangement (30) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement (2) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement (2) comprising a numerical aperture (32) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.

REFERENCES:
patent: 7158229 (2007-01-01), Norton et al.
patent: 2002/0090744 (2002-07-01), Brill et al.
patent: 2003/0002021 (2003-01-01), Sato
patent: 2003/0020917 (2003-01-01), Mundt et al.

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