Optical waveguides – Having particular optical characteristic modifying chemical...
Reexamination Certificate
2007-05-29
2007-05-29
Font, Frank G. (Department: 2883)
Optical waveguides
Having particular optical characteristic modifying chemical...
C385S014000, C385S037000, C385S039000, C385S129000, C385S142000, C385S144000, C438S031000, C438S032000, C438S037000
Reexamination Certificate
active
10620176
ABSTRACT:
Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light is used to shift the index-of-refraction of planar optical structures to shift the index-of-refraction of the photosensitive material to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using, photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.
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Bryan Michael A.
Kambe Nobuyuki
Dardi Peter S.
Dardi & Associates PLLC
Font Frank G.
Mooney Michael P.
NeoPhotonics Corporation
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