Optical mask using phase shift and method of producing the same

Details Optical mask using phase shift and method of producing the same Optical mask using phase shift and method of producing the same

1993-10-22

1995-06-13

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430320, G03F 900

Patent

active

054241537

ABSTRACT:
A phase shift optical mask is used for exposing a pattern using an exposure light. The phase shift optical mask includes a substrate which is transparent with respect to the exposure light, a light blocking layer which is non-transparent with respect to the exposure light and is provided on the substrate, where the light blocking layer has an opening having a predetermined shape and size and being defined by a side wall of the light blocking layer, and a phase shift layer which is transparent with respect to the exposure light and is provided on the light blocking layer and the substrate which is exposed within the opening. The phase shift layer has a uniform thickness, and the light blocking layer has a predetermined thickness so that a phase of the exposure light transmitted through the phase shift layer provided on the side wall of the light blocking layer is shifted by approximately 180.degree. relative to a phase of the exposure light transmitted through the phase shift layer provided on the substrate.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
Patent Abstracts of Japan, vol. 14, No. 376 (P-1092) Aug. 14, 1990 & JP-A-2 140743 (Hitachi Ltd) May 30, 1990.

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